TAPES3 – Technology Advances for Pilotline of Enhanced Semiconductors for 3nm

The TAPES3 project aims to discover, develop and demonstrate lithographic, metrology, EUV mask technology, devices.
The goal is to process modules enabling 3nm node technology. TAPES3 addresses and targets the grand challange of ""More Moore Equipment and Materials for sub 10nm technologies"" by exploring the requirements and solutions for the 3nm node.

Details

Status:

  • inactive

Supported by BayFOR:

  • inactive

Research Focus:

  • Other(s) , 
  • Social Sciences

Project Coordination:

No results found.

Other Partners:

Siemens Industry Software (A Limited Liability Company - Private Free Zone), Egypt ASML, Netherlands Demcon life science & health, Netherlands FEI Electron Optics, Netherlands Nederlandse Organisatie voor Toegepast Natuurwetenschappelijk Onderzoek, Netherlands VDL Enabling Technologies Group, Netherlands Applied Materials, Belgium LAM Research, Belgium Interuniversity Microelectronics Centre, Belgium JSR Micor NV, Belgium Siemens Industry Software, Belgium Applied Materials, Israel KLA-Tencor Cooperation, Israel NOVA LTD, Israel Advanced Mask Technology Center GmbH&Co KG, Germany Fraunhofer Gesellschaft zur Förderung der angewandten Forschung e.V., Germany Institut für Mikroelektronik Stuttgart, Germany optiX fab GmbH, Germany Physikalisch-technische Bundesanstalt, Germany Rheinisch-Westfälische Technische Hochschule Aachen, Germany Siltronic AG, Germany SUSS MicroTec SE, Germany Carl Zeiss SMT, Germany Conventor Sarl, France Ion Beam Services, France RECIF Technologies, France LAM Research AG, Austria Oxford Instruments Nanotechnology Tools Limited, United Kingdom Paul Scherrer Institut, Swizerland

Countries:

Germany (Bavaria), Egypt

Funding Agency:

European Union (EU)

Funding Type:

Horizon Europe (HEU)

Duration:

01/10/2018
– 31/01/2022

Budget:

121116315 EUR

URL: