TAPES3 – Technology Advances for Pilotline of Enhanced Semiconductors for 3nm

The TAPES3 project aims to discover, develop and demonstrate lithographic, metrology, EUV mask technology, devices.
The goal is to process modules enabling 3nm node technology. TAPES3 addresses and targets the grand challange of ""More Moore Equipment and Materials for sub 10nm technologies"" by exploring the requirements and solutions for the 3nm node.

Details

Status:

  • inactive

Research Focus:

  • Other(s) , 
  • Social Sciences

Project Coordination:

No results found.

Partners:

Siemens Industry Software (A Limited Liability Company – Private Free Zone), Egypt

ASML, Netherlands
Demcon life science & health, Netherlands
FEI Electron Optics, Netherlands
Nederlandse Organisatie voor Toegepast Natuurwetenschappelijk Onderzoek, Netherlands
VDL Enabling Technologies Group, Netherlands
Applied Materials, Belgium
LAM Research, Belgium
Interuniversity Microelectronics Centre, Belgium
JSR Micor NV, Belgium
Siemens Industry Software, Belgium
Applied Materials, Israel
KLA-Tencor Cooperation, Israel
NOVA LTD, Israel
Advanced Mask Technology Center GmbH&Co KG, Germany
Fraunhofer Gesellschaft zur Förderung der angewandten Forschung e.V., Germany
Institut für Mikroelektronik Stuttgart, Germany
optiX fab GmbH, Germany
Physikalisch-technische Bundesanstalt, Germany
Rheinisch-Westfälische Technische Hochschule Aachen, Germany
Siltronic AG, Germany
SUSS MicroTec SE, Germany
Carl Zeiss SMT, Germany
Conventor Sarl, France
Ion Beam Services, France
RECIF Technologies, France
LAM Research AG, Austria
Oxford Instruments Nanotechnology Tools Limited, United Kingdom
Paul Scherrer Institut, Swizerland

Countries:

Germany (Bavaria), Egypt

Funding Agency:

European Union (EU)

Funding Type:

Horizon Europe (HEU)

Duration:

01/10/2018
– 31/01/2022

Budget:

121116315 EUR

URL: